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Structural, magnetic and electrical transport properties of Sm0.43Nd0.10Sr0.47MnO3 thin film by DC-magnetron sputtering

IR@NPL: CSIR-National Physical Laboratory, New Delhi

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Title Structural, magnetic and electrical transport properties of Sm0.43Nd0.10Sr0.47MnO3 thin film by DC-magnetron sputtering
 
Creator Ramkumar, S.
Rajarajan, G.
Singh, H. K.
 
Subject Electronics and Electrical Engineering
Materials Science
Applied Physics/Condensed Matter
 
Description The paper contributes the preparation and characterization of Sm0.43Nd0.10Sr0.47MnO3 thin film. The thin film deposited on the single crystal of LaAlO3 (001) substrates by DC-magnetron sputtering at 1053 K at a pressure of 200 m Torr. The deposited thin film was found to have insulating behavior when annealed in oxygen atmosphere at 1223 K for 24 h. The X-ray diffraction (XRD) study shows that, both 30 nm and 60 nm thin films reveal compressive strain. The magnetic measurement (M-H) shows that the paramagnetic to ferromagnetic transition temperature of 60 nm film is 145 K. At higher film thickness (similar to 60 nm) a sharp insulator-to-metal transition is observed at 142 K (T-IM = 142 K). 60 nm film show a huge temperature co-efficient of resistance (TCR) and low field magneto resistance/an-isotropic magneto resistance (MR/AMR) is observed. The difference in the magneto transport properties of the two films have been explained in terms of presence of the magnetically and structurally disordered layer at the film-substrate interface.
 
Publisher Springer Verlag
 
Date 2016-05
 
Type Article
PeerReviewed
 
Format application/pdf
 
Identifier http://npl.csircentral.net/2371/1/Structural%2C%20magnetic%20and.pdf
Ramkumar, S. and Rajarajan, G. and Singh, H. K. (2016) Structural, magnetic and electrical transport properties of Sm0.43Nd0.10Sr0.47MnO3 thin film by DC-magnetron sputtering. Journal of Materials Science: Materials in Electronics, 27 (5). 5114-5120 . ISSN 0957-4522
 
Relation http://npl.csircentral.net/2371/