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Influence of active nitrogen species on surface and optical properties of epitaxial GaN films

IR@NPL: CSIR-National Physical Laboratory, New Delhi

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Title Influence of active nitrogen species on surface and optical properties of epitaxial GaN films
 
Creator Aggarwal, Neha
Krishna, Shibin
Mishra, Monu
Maurya, K. K.
Gupta, Govind
 
Subject Physical Chemistry
Materials Science
Metallurgy & Metallurgical Engineering
 
Description Influence of active nitrogen species on surface and optical properties of homoepitaxial GaN films grown on GaN epilayers has been investigated. The epitaxial GaN films were grown at varying plasma powers (350-500 W) under identical growth conditions. High resolution X-Ray diffraction, Field Emission Scanning Electron Microscopy, Atomic Force Microscopy and Photoluminescence measurements were employed to characterize the structural, morphological and optical properties of the grown GaN films. High plasma power (500 W) lead to an increment in active nitrogen radicals and yielded high crystalline quality with reduced dislocations compared to low plasma power (350, 400 W) which divulge the presence of metallic gallium on the surface and low roughness. The valence band maximum position, electron affinity and ionization energy of the films increased with increment in plasma power. PL measurements revealed narrow and intense band to band edge emission with negligible defect related yellow band peak for the sample grown at 500 W. The analysis conveyed that higher amount of active nitrogen species encouraged good optical properties with insignificant defect states which can be employed for the fabrication of high performance optoelectronic & photovoltaic devices.
 
Publisher Elsevier
 
Date 2016-03-15
 
Type Article
PeerReviewed
 
Format application/pdf
 
Identifier http://npl.csircentral.net/2255/1/Influence%20of%20active%20nitrogen.pdf
Aggarwal, Neha and Krishna, Shibin and Mishra, Monu and Maurya, K. K. and Gupta, Govind (2016) Influence of active nitrogen species on surface and optical properties of epitaxial GaN films. Journal of Alloys and Compounds, 661. 461-465 . ISSN 0925-8388
 
Relation http://npl.csircentral.net/2255/