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Zinc-Manganese alloy plating - a critical review

IR@CECRI: CSIR-Central Electrochemical Research Institute, Karaikudi

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Title Zinc-Manganese alloy plating - a critical review
 
Creator John, S.
Silaimani, S.M.
Anand, V.
Vasudevan, T.
 
Subject Industrial Metal Finishing
 
Description Hundreds of alloy baths of the commonly plated metals have been reported in the literature and continue to be investigated by plating researchers. The field of zinc alloy plating has undergone enormous development in comparison to any other plating during the last few decades. It is also the fact that in total literage and number of installations, zinc is the leading metal deposited in the electroplating world. Plating electrolytes are subjected to constant change from a multitude of variables such as bath temperature, pH, CD, bath composition, addition agents, impurities, anode polarization, degree of agitation and nature of current. With the increased sophistication of the industry and the introduction of automated bath analysis, control of alloy plating bath may be much less of a factor. The basic reason for plating from an alloy bath is to produce some desired change in the deposit unobtainable from the pure metal bath. The toxicity of cadmium has led to the development of several zinc alloy systems. Such alloys also possesses excellent corrosion resistance in comparison to cadmium. Amongst the four commercially available zinc alloy systems such as zinc-nickel, zinc-cobalt, zinc-iron and zinc-manganese the last one is least investigated though it possesses excellent corrosion resistance. This paper gives a critical review of zinc-manganese alloy deposition system
 
Publisher Central Electrochemical Research Institute
 
Date 2002
 
Type Article
PeerReviewed
 
Format application/pdf
 
Identifier http://cecri.csircentral.net/1282/1/023-2002.pdf
John, S. and Silaimani, S.M. and Anand, V. and Vasudevan, T. (2002) Zinc-Manganese alloy plating - a critical review. Bulletin of Electrochemistry , 18 (9). pp. 407-412. ISSN 0256-1654
 
Relation http://cecri.csircentral.net/1282/